Aluminum nitride/ air-gap structures fabricated via selective wet chemical etching

Aluminum nitride/air-gap structures were fabricated via selective wet chemical etching by removing the sacrificial aluminum layers from the Al/AlN superlattice. Five pairs of alternating Al and AlN layers were deposited on silicon and glass substrates using reactive magnetron sputtering. Scanning el...

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Bibliographic Details

Main Author:	Abat, Jonathan Ray R. (Author)
Other Authors:	Somintac, Armand S. (adviser.)
Format:	Thesis
Language:	English
Published:	Quezon City National Institute of Physics, College of Science, University of the Philippines Diliman 2013.
Subjects:	Aluminum nitride. Etching.